Nanocrystalline SiC films deposited at low temperature using hot filament chemical vapor deposition

Nanocrystalline SiC films deposited at low temperature using hot filament chemical vapor deposition

著者名:

Yu, W. ( Hebei Univ. (China) )
Zheng, Z.Y.
Han, L.
Fu, G.S.

掲載資料名:

Materials, Devices, and Systems for Display and Lighting

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4918

発行年:

2002

開始ページ:

227

終了ページ:

230

総ページ数:

4

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819447074 [0819447072]

言語:

英語

請求記号:

P63600/4918

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012767
シリーズID:	PA00000029
会議名:	Photonics Asia : Materials, devices, and systems for display and lighting
回次:	2002
会議開催地:	Shanghai, China
会議開催年:	2002.10.15-2002.10.17

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