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Analytical approach to X-phenomenon in alternating phase-shifting masks

著者名:
Park, J.R. ( Samsung Electronics Co., Ltd. (South Korea) )
Kim, S.-H.
Lee, H.-J.
Jang, I.-Y.
Choi, Y.-H.
Yang, S.-H.
Lee, Y.-H.
Kim, Y.-H.
Choi, S.-W.
Yoon, H.-S.
Sohn, J.-M.
さらに 6 件
掲載資料名:
22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4889
発行年:
2002
巻:
Part Two
開始ページ:
1209
終了ページ:
1216
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
言語:
英語
請求記号:
P63600/4889
資料種別:
国際会議録

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