Blank Cover Image

Pattern displacement induced by lens aberrations

著者名:
Hendrickx, E. ( IMEC vzw (Belgium) )
Vandenberghe, G.
Ronse, K.G.
Colina, A. ( ASML (Netherlands) )
van der Hoff, A.
Dusa, M.V.
Finders, J.
さらに 2 件
掲載資料名:
22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4889
発行年:
2002
巻:
Part Two
開始ページ:
1155
終了ページ:
1162
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819446756 [0819446750]
言語:
英語
請求記号:
P63600/4889
資料種別:
国際会議録

類似資料:

1 国際会議録 CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques

Vandenberghe,G., Marschner,T., Ronse,K., Socha,R.J., Dusa,M.V.

SPIE - The International Society for Optical Engineering
7 国際会議録 (Sub-) 100-nm gate patterning using 248-nm alternating PSM

Vandenberghe,G.N., Jaenen,P., Jonckheere,R.M., Ronse,K., Toublan,O.

SPIE-The International Society for Optical Engineering
2 国際会議録 KrF lithography for 130 nm

Finders,J., Schoot,J.B.van, Vanoppen,P., Dusa,M.V., Socha,R.J., Vandenberghe,G., Ronse,K.

SPIE - The International Society for Optical Engineering
8 国際会議録 AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35

E. Hendrickx, R. Birkner, M. Kempsell, A. Tritchkov, G. Vandenberghe

Society of Photo-optical Instrumentation Engineers
3 国際会議録 Linewidth asymmetry study to predict aberration in lithographic lenses

Kye,J., Dusa,M.V., Levinson,H.J.

SPIE-The International Society for Optical Engineering
9 国際会議録 60nm half pitch contact layer printing: exploring the limits at 1.35NA lithography

J. Bekaert, E. Hendrickx, G. Vandenberghe

Society of Photo-optical Instrumentation Engineers
4 国際会議録 Progress in 193nm immersion lithography at IMEC

Ronse, K., Vandenberghe, G., Hendrickx, E., Leunissen, L. H. A., Aksenov, Y.

SPIE - The International Society of Optical Engineering
10 国際会議録 Extending ArF to the 65-nm node with full-phase lithography

Driessen, F.A., Pierrat, C., Vandenberghe, G., Ronse, K.G., Adrichem, P., Liu, H.-Y.

SPIE-The International Society for Optical Engineering
5 国際会議録 Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

Park, J., Hsu, S., Van Den Broeke, D., Chen, J. F., Dusa, M., Socha, R., Finders, J., Vleeming, B., van Oosten, A., …

SPIE - The International Society of Optical Engineering
11 国際会議録 Recent trends and progress in deep-UV lithography

Ronse,K., Goethals,A.M., Vandenberghe,G., Maenhoudt,M.

SPIE - The International Society for Optical Engineering
6 国際会議録 Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process

Verhaegen, S., Vandenberghe, G., Jonckheere, R.M., Ronse, K.G.

SPIE-The International Society for Optical Engineering
12 国際会議録 Through-pitch low-k1 contact hole imaging with CPL technology

Wiaux, V., Bekaert, J., Chen, J.F., Hsu, S.D., Ronse, K.G., Socha, R.J., Vandenberghe, G., Van Den Broeke, D.J.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12