Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL)
- 著者名:
Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. Wampler, K.E. Hsu, S. Shi, X. Hsu, M. Burchard, P. Chen, J.F. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 579
- 終了ページ:
- 591
- 総ページ数:
- 13
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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