Application of Cr-less mask technology for sub-100-nm gate with single exposure
- 著者名:
Kim, S.-H. ( Samsung Electronics Co., Ltd. (South Korea) ) Chung, D.-H. Park, J.S.. Shin, I.K. Choi, S.W. Sohn, J.-M. Lee, J.-H. Shin, H.-S. Chen, J.F. ( ASML Masktools, Inc. (USA) ) Van Den Broeke, D.J. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 568
- 終了ページ:
- 578
- 総ページ数:
- 11
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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