Full phase-shifting methodology for 65-nm-node lithography

Full phase-shifting methodology for 65-nm-node lithography

著者名:: Pierrat, C. ( Numerical Technologies, Inc. (USA) )
掲載資料名:: 22nd Annual BACUS Symposium on Photomask Technology
シリーズ名:: Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:: 4889
発行年:: 2002
巻:: Part One
開始ページ:: 558
終了ページ:: 567
総ページ数:: 10
出版情報:: Bellingham, WA: SPIE-The International Society for Optical Engineering
ISSN:: 0277786X
ISBN:: 9780819446756 [0819446750]
言語:: 英語
請求記号:: P63600/4889
資料種別:: 国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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1 国際会議録 Full phase-shifting methodology for 65-nm node lithography Pierrat, C., Driessen, F.A.J.M., Vandenberghe, G. SPIE-The International Society for Optical Engineering	7 国際会議録 New alternating phase-shifting mask conversion methodology using phase conflict resolution Pierrat, C., Cote, M.L., Patterson, K. SPIE-The International Society for Optical Engineering
2 国際会議録 Extending ArF to the 65-nm node with full-phase lithography Driessen, F.A., Pierrat, C., Vandenberghe, G., Ronse, K.G., Adrichem, P., Liu, H.-Y. SPIE-The International Society for Optical Engineering	8 国際会議録 New BARC materials for the 65-nm node in 193-nm lithography Neef, C.J., Krishnamurthy, V., Nagatkina, M.I., Bryant, E., Windsor, M., Nesbit, C. SPIE - The International Society of Optical Engineering
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