Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS

Mask error enhancement-factor (MEEF) metrology using automated scripts in CATS

著者名:

van Adrichem, P.J.M. ( Numerical Technologies, Inc. (Netherlands) )
Driessen, F.A.J.M.
van Hasselt, K. ( Philips Semiconductors (Netherlands) )
Brueck, H.-J. ( MueTec GmbH (Germany) )

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

551

終了ページ:

557

総ページ数:

7

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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