Characterization of repairs to KrF 300-mm wafer printability for 0.13-pm design rule with attenuated phase-shifting mask

Characterization of repairs to KrF 300-mm wafer printability for 0.13-pm design rule with attenuated phase-shifting mask

著者名:

Chou, W. ( United Microelectronics Corp. (Taiwan)Tseng, )

Chen, T.

Tseng, W.

Huang, P.

Tseng, C.C. ( DuPont Photomasks Taiwan Ltd. (Taiwan) )

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

498

終了ページ:

508

総ページ数:

11

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

類似資料:

1 国際会議録 Correlation of reticle defects detectability and repairs to ArF wafer printability for 0.13-μm design rule with binary OPC/SB mask Phan,K.A., Spence,C.A., Riddick,J., Chen,J.X., Lamantia,M., Villa,H.A. SPIE-The International Society for Optical Engineering	7 国際会議録 CAR dry etching technology to produce 0.13-μm reticle Chou, W.-Z., Tsai, F.-G., Tuo, C.C., Yoo, C.S., Tsai, T.S., Shue, L. SPIE-The International Society for Optical Engineering
2 国際会議録 Printing 0.13-μm contact holes using 193-nm attenuated phase-shifting masks Wang,C.-M.A., Lin,S.-J., Lin,C.-H., Ku,Y.-C., Yen,A. SPIE-The International Society for Optical Engineering	8 国際会議録 TiSix as a new embedded material for attenuated phase-shift mask Loong,W., Chen,T., Shy,S., Tseng,J., Lin,R. SPIE-The International Society for Optical Engineering
3 国際会議録 0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks Chen,Y.T., Lin,C.H., Lin,H.T., Hsieh,H.C., Yu,S.S., Yen,A. SPIE - The International Society for Optical Engineering	9 国際会議録 Printability and repair of defects in rim and attenuated phase shift masks P.D. Prewett, Z. Cui, J.G. Watson, B. Martin Society of Photo-optical Instrumentation Engineers
4 国際会議録 MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J. SPIE-The International Society for Optical Engineering	10 国際会議録 DUV printability of laser repairs on binary and attenuated phase-shift masks Reynolds,J.A., Schellenberg,F.M., Hibbs,M.S., Hayden,D. SPIE-The International Society for Optical Engineering
5 国際会議録 The study of phase angle effects to wafer process window using 193-nm EAPSM in a 300-mm wafer manufacturing environment Chou, W.Y., Yen, S.M., Wu, J.K., Shieh, W.B., Chuang, M., Fan, G., Tseng, C.C., Hughes, G.P., MacDonald, S.S., Holiday, … SPIE - The International Society of Optical Engineering	11 国際会議録 Defect printability and repair of alternating phase-shift masks Friedrich,C., Verbeek,M., Mader,L., Crell,C., Pforr,R., Griesinger,U.A. SPIE - The International Society for Optical Engineering
6 国際会議録 Integration of attenuated phase-shift mask to 0.13-ｦﾌm technology contact level masking process Choo,L.C., Park,O., Sack,M.J., Tam,S. SPIE - The International Society for Optical Engineering	12 国際会議録 Defect dispositiong using mask printability analysis on alternating phase-shifting masks Chang, C.-H., Hsieh, C.-H., Tzu, S.-D., Dai, C.-M., Lin, B. J., Pang, L., Qian, Q.-D., Chen, J.-H., Huang, J. H. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12