Reliable subnanometer repeatability for CD metrology in a reticle production environment

Reliable subnanometer repeatability for CD metrology in a reticle production environment

著者名:

Hourd, A.C. ( Compugraphics International Ltd. (UK) )

Grimshaw, A.

Scheuring, G. ( MueTec GmbH (Germany) )

Chen, S.-B. ( Taiwan Mask Corp. (Taiwan) )

Chen, P.W.

Jonckheere, R.M. ( IMEC vzw (Belgium) )

Philipsen, V.

Hartmann, M. ( PDF Solutions GmbH (Germany) )

Ordynskyy, V.

Peter, K.

Schaetz,T. ( Infineon Technologies AG (Germany) )

Sommer, K. ( Karl Sommer Consulting (Germany) )

さらに 11 件

掲載資料名:

22nd Annual BACUS Symposium on Photomask Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4889

発行年:

2002

巻:

Part One

開始ページ:

319

終了ページ:

327

総ページ数:

9

出版情報:

Bellingham, WA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446756 [0819446750]

言語:

英語

請求記号:

P63600/4889

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012736
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2002 : 22nd
会議開催地:	Monterey, California, USA
会議開催年:	2002.10.011-2002.10.04

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