Phase defect repair for the chromeless phase lithography (CPL) mask
- 著者名:
Fan, S. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Hsu, M. ( ASML MaskTools, Inc. (USA) ) Tseng, A. ( Toppan Chunghwa Electronics Co., Ltd. (Taiwan) ) Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. Lei, H. ( United Microelectronic Corp. (Taiwan) ) Hsu, S. ( ASML MaskTools, Inc. (USA) ) Shi, X. - 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 221
- 終了ページ:
- 231
- 総ページ数:
- 11
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |