Analysis of the impact of reticle CD variations on the available process windows for a 100-nm CMOS process
- 著者名:
- Verhaegen, S. ( IMEC vzw (Belgium) )
- Vandenberghe, G.
- Jonckheere, R.M.
- Ronse, K.G.
- 掲載資料名:
- 22nd Annual BACUS Symposium on Photomask Technology
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4889
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 197
- 終了ページ:
- 208
- 総ページ数:
- 12
- 出版情報:
- Bellingham, WA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819446756 [0819446750]
- 言語:
- 英語
- 請求記号:
- P63600/4889
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
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SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Assessment of EUV reticle blank availability enabling the use of EUV tools today and in the future
SPIE - The International Society of Optical Engineering |