Picosecond laser system for photomask repair with nanometer accuracy

Picosecond laser system for photomask repair with nanometer accuracy

著者名:

Togawa, T. ( NEC Corp. (Japan) )
Ueda, A.
Morishige, Y.
Suzuki, Y.

掲載資料名:

Third International Symposium on Laser Precision Microfabrication : proceedings : 27-31 May, 2002, Osaka, Japan

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4830

発行年:

2003

開始ページ:

346

終了ページ:

351

総ページ数:

6

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819446015 [0819446017]

言語:

英語

請求記号:

P63600/4830

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012667
シリーズID:	PA00000029
会議名:	International Symposium on Laser Precision Microfabrication
回次:	2002 : 3rd
会議開催地:	Osaka, Japan
会議開催年:	2002.05.27-2002.05.31

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