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Use of deep reactive ion etching in the fabrication of high-efficiency high-resolution crystal x-ray analyzers

著者名:
Shew, B.-Y. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Huang, R.-S. ( Tsing Hua Univ. (Taiwan) )
Wang, D.-J. ( Synchrotron Radiation Research Ctr. (Taiwan) )
Perng, S.-Y.
Kuan, C.-K.
Cai, Y.Q.
Chow, P.C.
Schwoerer-Boehning, M. ( Argonne National Lab. (USA) )
Caliebe, W. ( Brookhaven National Lab. (USA) )
Kao, C.-C.
Chen, C.T. ( Synchrotron Radiation Research Ctr. (Taiwan) )
さらに 6 件
掲載資料名:
Design and microfabrication of novel x-ray optics : 9 July 2002, Seattle, Wasington, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4783
発行年:
2002
開始ページ:
131
終了ページ:
138
総ページ数:
8
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445506 [0819445509]
言語:
英語
請求記号:
P63600/4783
資料種別:
国際会議録

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