Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results
- 著者名:
Hourd, A.C. ( Compugraphics International Ltd. (UK) ) Grimshaw, A. Scheuring, G. ( MueTec GmbH (Germany) ) Gittinger, C. Brueck, H.-J. Chen, S.-B. ( Taiwan Mask Corp ) Chen, P.W. Hartmann, H. ( PDF Solutions GmbH (Germany) ) Ordynskyy, V. Jonckheere, R.M. ( IMEC vzw (Belgium) ) Philipsen, V. Schaetz, T. ( Infineon Technologies AG (Geramny) ) Sommer, K. ( Karl Sommer consulting (Germany) ) - 掲載資料名:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4764
- 発行年:
- 2002
- 開始ページ:
- 168
- 終了ページ:
- 174
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- 言語:
- 英語
- 請求記号:
- P63600/4764
- 資料種別:
- 国際会議録
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3
国際会議録
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |