Plasma etch of Cr masks utilizing TCP source for a next-generation plasma source
- 著者名:
Kwon, H.-J. ( PKL Corp. (Korea) ) Min, D.-S. Jang, P.-J. Chang, B.-S. Choi, B.-Y. Jeong, S.-H. - 掲載資料名:
- 18th European Conference on Mask Technology for Integrated Circuits and Microcomponents
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4764
- 発行年:
- 2002
- 開始ページ:
- 60
- 終了ページ:
- 65
- 総ページ数:
- 6
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445315 [0819445312]
- 言語:
- 英語
- 請求記号:
- P63600/4764
- 資料種別:
- 国際会議録
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