Mask availability for next-generation lithography

Mask availability for next-generation lithography

著者名:

Lercel, M.J. ( Photronics, Inc. (USA) )

Fisch, E. ( IBM (USA) )

掲載資料名:

18th European Conference on Mask Technology for Integrated Circuits and Microcomponents

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4764

発行年:

2002

開始ページ:

18

終了ページ:

22

総ページ数:

5

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445315 [0819445312]

言語:

英語

請求記号:

P63600/4764

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012602
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask technology for Integrated Circuits and Microcomponents
回次:	2002 : 18th
会議開催地:	Munich, Germany
会議開催年:	2002.01.15-2002.01.16

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4 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering	10 国際会議録 Image size control in next generation lithography masks Lercel,M.J., Magg,C. SPIE - The International Society for Optical Engineering
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