EPL mask fabrication

EPL mask fabrication

著者名:

Lercel, M.J. ( IBM Microelectronics Div. (USA) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4754

発行年:

2002

開始ページ:

790

終了ページ:

798

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445179 [0819445177]

言語:

英語

請求記号:

P63600/4754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012591
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2002 : 9th
会議開催地:	Yokohama, Japan
会議開催年:	2002.04.23-2002.04.25

類似資料:

1 国際会議録 Status of fabrication of square-format masks for extreme-ultraviolet lithography (EUVL) at the MCoC Racette, K.C., Williams, C.T., Fisch, E., Kindt, L., Lawliss, M., Ackel, R., Lercel, M.J. SPIE-The International Society for Optical Engineering	7 国際会議録 Reduction of image placement errors in EPL masks (Invited Paper) II, O.R.W., Reu, P.L., Engelstad, R.L., Lovell, E.G., Lercel, M.J., Thiel, C.W., Lawliss, M.S., Mackay, R.S. SPIE-The International Society for Optical Engineering
2 国際会議録 Mask availability for next-generation lithography Lercel, M.J., Fisch, E., Racette, K.C., Lawliss, M., Williams, C. T., Kindt, L., Huang, C. SPIE-The International Society for Optical Engineering	8 国際会議録 Evaluation of an advanced chemically amplified resist for next-generation lithography mask fabrication Magg,C., Lercel,M.J., Lawliss,M., Kwong,R.W., Huang,W.-S., Angelopoulos,M. SPIE-The International Society for Optical Engineering
3 国際会議録 EUVL mask fabrication for the 45-nm node Fisch, E., Kindt, L., Lercel, M.J., Racette, K.C., Williams, C.T. SPIE-The International Society for Optical Engineering	9 国際会議録 Inspection and repair of EUV Fisch,E., Kindt,L., Lercel,M.J., Schmidt,M.R. SPIE-The International Society for Optical Engineering
4 国際会議録 Evaluation and comparison of the pattern transfer-induced image placement distortions on e-beam projection lithography masks Magg,C., Lercel,M.J., Lawliss,M., Ackel,R., Caldwell,N., Kindt,L., Racette,K.C., Williams,C., Reu,P.L. SPIE-The International Society for Optical Engineering	10 国際会議録 Next-generation lithography mask development at the NGL Mask Center of Competency Lercel,M.J., Brooks,C.J., Racette,K.C., Magg,C., Lawliss,M., Caldwell,N., Jeffer,R., Collins,K.W., Barrett,M., … SPIE - The International Society for Optical Engineering
5 国際会議録 Process for improved reflectivity uniformity in extreme-ultraviolet lithography (EUVL) masks Thiel, C., Racette, K.C., Fisch, E., Lawliss, M., Kindt, L., Huang, C., Ackel, R., Levy, M. SPIE-The International Society for Optical Engineering	11 国際会議録 Next-generation lithography mask development at the NGL-MCOC Lercel,M.J., Racette,K.C., Magg,C., Lawliss,M., Collins,K.W., Barrett,M., Trybendis,M.J., Bouchard,L. SPIE - The International Society for Optical Engineering
6 国際会議録 Analysis of critical parameters for EPL mask fabrication (Invited Paper) Lercel, M.J. SPIE-The International Society for Optical Engineering	12 国際会議録 Chemically amplified resists for electron-beam projection lithography mask fabrication Magg,C., Lercel,M.J. SPIE - The International Society for Optical Engineering

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