Development of mask-making process for CLM manufacturing technology
- 著者名:
Park, J.-H. ( Samsung Electronics Co., Ltd. (Korea) ) Chung, D.-H. Lee, M.-K. Shin, I.-K. Choi, S.-W. Yoon, H.-S. Sohn, J.-M. Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Van Den Broeke, D.J. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 727
- 終了ページ:
- 736
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Trans Tech Publications |
3
国際会議録
Full-chip application for SRAM gate at 100-nm node and beyond using chromeless phase lithography
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
10
国際会議録
Doubly exposed patterning using mutually one-pitch step-shifted alternating phase-shift masks
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |