Defect dispositiong using mask printability analysis on alternating phase-shifting masks
- 著者名:
Chang, C.-H. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Hsieh, C.-H. Tzu, S.-D. Dai, C.-M. Lin, B. J. Pang, L. ( Numerical Technologies, Inc. (USA) ) Qian, Q.-D. Chen, J.-H. Huang, J. H. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 622
- 終了ページ:
- 629
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
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SPIE - The International Society for Optical Engineering |
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |