Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

Feasibility study of TaSiOx-type Att-PSM for 157-nm lithography

著者名:

Watanabe, K. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4754

発行年:

2002

開始ページ:

444

終了ページ:

451

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445179 [0819445177]

言語:

英語

請求記号:

P63600/4754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012591
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2002 : 9th
会議開催地:	Yokohama, Japan
会議開催年:	2002.04.23-2002.04.25

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1 国際会議録 Feasibility study of SCAAM-type Alt-PSM for 157-nm lithography Morikawa, Y., Kokubo, H., Noguchi, K., Sasaki, S., Mohri, H., Hoga, M., Kanda, N., Irie, S., Watanabe, K., Suganaga, T., … SPIE-The International Society for Optical Engineering	7 国際会議録 Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens Watanabe, K., Kurose, E., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering
2 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	8 国際会議録 157-nm chromeless phase lithography for 45-nm SRAM gate Suganaga, T., Watanabe, K., Matsuura, S., Hagiwara, T., Furukawa, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering
3 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering	9 国際会議録 Meeting the challenges of 157-nm microstepper technology Yamabe, O., Uchida, N., Itani, T. SPIE-The International Society for Optical Engineering
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