Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)
- 著者名:
Yoon, S.-Y. ( PKL (Korea) ) Choi, S.-J. Kim, Y.-D. Lee, D.-H. Cha, H.-S. Kim, J.-M. Choi, S.-S. Jeong, S.H. - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 332
- 終了ページ:
- 340
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
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