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Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

著者名:
Choi, S.-J. ( PKL (Korea) )
Cha, H.-S.
Yoon, S.-Y.
Kim, Y.-D.
Lee, D.-H.
Kim, J.-M.
Kim, J.-S.
Min, D.-S.
Jang, P.-J.
Chang, B.-S.
Kwon, H.-J.
Choi, B.-Y.
Choi, S.-S.
Jeong, S.H.
さらに 9 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4754
発行年:
2002
開始ページ:
303
終了ページ:
311
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
言語:
英語
請求記号:
P63600/4754
資料種別:
国際会議録

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