Model of coating and drying process for flat polymer film fabrication
- 著者名:
Kagami, H. ( Kumamoto Technology & Industry Foundation (Japan) ) Miyagawa, R. ( Kumamoto Industrial Research Institute (Japan) ) Kawata, A. ( Zeon Corp. (Japan) ) Nakashima, D ( Kumamoto Univ. (Japan) ) Kobayashi, S. ( Tokyo Electron Kyushu Ltd. (Japan) ) Kitano, T. Takeshita, K. Kubota, H. ( Kumamoto Univ. (Japan) ) Ohmi, T. ( Tohoku Univ. (Japan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology IX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4754
- 発行年:
- 2002
- 開始ページ:
- 252
- 終了ページ:
- 259
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819445179 [0819445177]
- 言語:
- 英語
- 請求記号:
- P63600/4754
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
Electrochemical Society |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Fabrication process of Cr-based attenuated phase-shift masks for KrF excimer laser Lithography
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
国際会議録
A modified dynamical model of drying process of polymer blend solution coated on a flat substrate
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |