Model of coating and drying process for flat polymer film fabrication

Model of coating and drying process for flat polymer film fabrication

著者名:

Kagami, H. ( Kumamoto Technology & Industry Foundation (Japan) )

Miyagawa, R. ( Kumamoto Industrial Research Institute (Japan) )

Kawata, A. ( Zeon Corp. (Japan) )

Nakashima, D ( Kumamoto Univ. (Japan) )

Kobayashi, S. ( Tokyo Electron Kyushu Ltd. (Japan) )

Kitano, T.

Takeshita, K.

Kubota, H. ( Kumamoto Univ. (Japan) )

Ohmi, T. ( Tohoku Univ. (Japan) )

さらに 4 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology IX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4754

発行年:

2002

開始ページ:

252

終了ページ:

259

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819445179 [0819445177]

言語:

英語

請求記号:

P63600/4754

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012591
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2002 : 9th
会議開催地:	Yokohama, Japan
会議開催年:	2002.04.23-2002.04.25

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