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Lithography strategy for 65-nm node (Invited Paper)

著者名:
Borodovsky, Y.A. ( Intel Corp. (USA) )
Schenker, R.E.
Allen, G.A.
Tejnil, E.
Hwang, D.H.
Lo, F.-C.
Singh, V.K.
Gleason, R.E.
Brandenburg, J.E.
Bigwood, R.M.
さらに 5 件
掲載資料名:
Photomask and Next-Generation Lithography Mask Technology IX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4754
発行年:
2002
開始ページ:
1
終了ページ:
14
総ページ数:
14
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819445179 [0819445177]
言語:
英語
請求記号:
P63600/4754
資料種別:
国際会議録

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