Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

Investigation of the physical and practical limits of dense-only phase-shift lithography for circuit feature definition

著者名:

Tyrrell, B. ( MIT Lincoln Lab.(USA) )

Fritze, M.

Mallen, R.D.

Wheeler, B.

Rhyins, P.D. ( Photronics,Inc.(USA) )

Martin, P.M.

さらに 1 件

掲載資料名:

Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4692

発行年:

2002

開始ページ:

503

終了ページ:

516

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444394 [0819444391]

言語:

英語

請求記号:

P63600/4692

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012527
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Design, process integration, and characterization for microelectronics
回次:	2002
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.06-2002.03.07

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2 国際会議録 Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography Fritze,M., Tyrrell,B., Astolfi,D.K., Davis,P., Wheeler,B., Mallen,R., Jarmolowicz,J., Cann,S.G., Chan,D.Y., Rhyins,P.D., … SPIE-The International Society for Optical Engineering	8 国際会議録 Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node Rhyins,P., Fritze,M., Chan,D., Carney,C., Blachowicz,B.A., Vieira,M., Mack,C.A. SPIE-The International Society for Optical Engineering
3 国際会議録 Minimization of image placement errors in chromeless phase-shift mask lithography Fritze, M., Tyrrell, B., Cann, S.G., Carney, C., Blachowicz, B.A., Brzozowy, D., Kocab, T., Bowdoin, S., Rhyins, P.D., … SPIE-The International Society for Optical Engineering	9 国際会議録 150-nm dense/isolated contact hole study with Canon IDEAL technique Ebihara,T., Rhyins,P., Oga,T., Martin,P.M., Sweis,M. SPIE-The International Society for Optical Engineering
4 国際会議録 Limits of strong phase-shift patterning for device research Fritze, M., Mallen, R.D., Wheeler, B., Yost, D., Snyder, J.P., Kasprowicz, B.S., Eynon, B.G., Liu, H.-Y. SPIE-The International Society for Optical Engineering	10 国際会議録 The improvement of the overlay accuracy using the reticle distortion correction for EPL technologies Fritze, M., Tyrrell, B., Fedynyshyn, T., Rothschild, M., Brooker, P. SPIE - The International Society of Optical Engineering
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