Blank Cover Image

Symmetry enhancement method for process modeling and its applications in IC design and OPC

著者名:
掲載資料名:
Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4692
発行年:
2002
開始ページ:
465
終了ページ:
470
総ページ数:
6
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444394 [0819444391]
言語:
英語
請求記号:
P63600/4692
資料種別:
国際会議録

類似資料:

1 国際会議録 Filtering noisy data for T-less model calibration

Lei, J., Lay, D.K.H.

SPIE-The International Society for Optical Engineering
7 国際会議録 Mask process effect aware OPC modeling

K. Koo, S. Lee, J. Hwang, D. Beale, M. St. John

Society of Photo-optical Instrumentation Engineers
2 国際会議録 Generalization of the photo process window and its application to OPC test pattern design

Eisenmann, H., Peter, K., Strojwas, A.J.

SPIE-The International Society for Optical Engineering
8 国際会議録 The First International Space Safety Standard

Bohie, D.K.H.

ESA Publications Division
3 国際会議録 PsmLint: bringing AltPSM benefits to the IC design stage

Ghosh, P., Kang, C., Sanie, M., Huckabay, J.A.

SPIE-The International Society for Optical Engineering
9 国際会議録 New OPC methods to increase process margin for sub-70nm devices

Hong, J. -S., Kim, D. -H., Kim, S. -W., Yoo, M. -H., Kong, J. -T.

SPIE - The International Society of Optical Engineering
4 国際会議録 Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application

Kim, H., Nam, D., Yeo, G.-S., Lee, S.-J., Woo, S.-G., Cho, H.-K., Han, W.-S.

SPIE - The International Society of Optical Engineering
10 国際会議録 Entity Model Based Quality Management: A First Step Towards High Reliability Organization Management

S. Engelbrecht, Chr. Radestock, D.K.H. Bohle

ESA Communications
5 国際会議録 Design-to-process integration: optimizing 130-nm X architecture manufacturing

Dean, R., Malhotra, V.K., King, N., Sanie, M., MacDonald, S.S., Jordan, J.D., Hirukawa, S.

SPIE-The International Society for Optical Engineering
11 国際会議録 Small signal ac-surface photovoltage technique for noncontact monitoring of near-surface doping for IC-processing

Marinskiy,D.N., Lagowski,J.J., Wilson,M., Jastrzebski,L., Santiesteban,R., Elshot,K.

SPIE-The International Society for Optical Engineering
6 国際会議録 Sequential COCOS and SPV Metrology and Its Application to IC Process Monitoring

Hoff,A.M., DeBusk,D.K.

SPIE - The International Society for Optical Engineering
12 国際会議録 OPC modeling by genetic algorithm

W.C. Huang, C.M. Lai, B. Luo, C.K. Tsai, C.S. Tsay, C.W. Lai, C.C. Kuo, R.G. Liu, H.T. Lin, B.J. Lin

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12