Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination | 東京工業大学附属図書館文献データベース

Blank Cover Image

Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination

著者名:

Petersen, J.S. ( Petersen Advanced Lithography,Inc(USA) )

Conley, W. ( Motorola(USA) )

Van Den Broeke, D.J. ( ASML Masktools,Inc.(USA) )

Gerold, D.J. ( Petersen Advanced Lithography,Inc.(USA) )

Socha, R.J. ( ASML TDC(USA) )

van Praagh, J. ( ASML(Netherlands) )

さらに 10 件

掲載資料名:

Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4692

発行年:

2002

開始ページ:

298

終了ページ:

311

総ページ数:

14

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444394 [0819444391]

言語:

英語

請求記号:

P63600/4692

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012527
シリーズID:	PA00000029
会議名:	Microelectronic Manufacturing : Design, process integration, and characterization for microelectronics
回次:	2002
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.06-2002.03.07

類似資料:

1 国際会議録 Development of a sub-100-nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination Petersen, J.S., Conley, W., Roman, B.J., Litt, L.C., Lucas, K., Wu, W., Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., … SPIE-The International Society for Optical Engineering	7 国際会議録 CPL reticle technology for advanced device applications Conley, W.E., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering
2 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	8 国際会議録 Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL) Van Den Broeke, D.J., Chen, J.F., Laidig, T.L., Hsu, S.D., Wampler, K.E., Socha, R.J., Petersen, J.S. SPIE-The International Society for Optical Engineering
3 国際会議録 Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology Socha, R.J., Van Den Broeke, D.J., Yu, L., Conley, W., Wu, W., Chen, J.F., Petersen, J.S., Gerold, D.J., van Praagh, J., … SPIE-The International Society for Optical Engineering	9 国際会議録 The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering
4 国際会議録 CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	10 国際会議録 Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL) Van Den Broeke, D.J., Socha, R., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., Shi, … SPIE - The International Society of Optical Engineering
5 国際会議録 The application of CPL reticle technology for the 0.045-mm node Conley, W., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering	11 国際会議録 Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL) Van Den Broeke, D.J., Laidig, T.L., Wampler, K.E., Hsu, S., Shi, X., Hsu, M., Burchard, P., Chen, J.F. SPIE-The International Society for Optical Engineering
6 国際会議録 Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering	12 国際会議録 Contact hole reticle optimization by using interference mapping lithography (IML) Socha, R.J., Van Den Broeke, D.J., Hsu, S.D., Chen, J.F., Laidig, T.L., Corcoran, N., Hollerbach, U., Wampler, K.E., … SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12