Direct to digital holography for semiconductor wafer defect detection and review(Invited Paper)
- 著者名:
Thomas, C.E., Jr. ( nLine Corp.(USA) ) Bahm, T.M. Baylor, L.R. ( Oak Ridge National Lab.(USA) ) Bingham, P.R. Burns, S.W. ( nLine Corp.(USA) ) Chidley, M.D. ( Oak Ridge National Lab.(USA) ) Dai, X.L. ( nLine Corp.(USA) ) Delahanty, R.J. Doti, C.J. El-Khashab, A. Fisher, R.L. Gilbert, J.M. Goddard, J.S. ( Oak Ridge National Lab.(USA) ) Hanson, G.R. Hickson, J.D. ( nLine Corp.(USA) ) Hunt, M.A. Hylton, K.W. ( Oak Ridge National Lab.(USA) ) John, G.C. ( nLine Corp.(USA) ) Jones, M.L. MacDonald, K.R. Mayo, M.W. McMackin, I. Patek, D.R. ( Oak Ridge National Lab.(USA) ) Price, J.H. ( nLine Corp.(USA) ) Rasmussen, D.A. ( Oak Ridge National Lab.(USA) ) Schaefer, L.J. ( nLine Corp.(USA) ) Scheidt, T.R. Schulze, M.A. Schumaker, P.D. Shen, B. Smith, R.G. Su, A.N. Tobin, K.W., Jr. ( Oak Ridge National Lab.(USA) ) Usry, W.R. ( nLine Corp.(USA) ) voelkl, E. Weber, K.S. Jones, P.G. Owen, R.W. - 掲載資料名:
- Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4692
- 発行年:
- 2002
- 開始ページ:
- 180
- 終了ページ:
- 194
- 総ページ数:
- 15
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444394 [0819444391]
- 言語:
- 英語
- 請求記号:
- P63600/4692
- 資料種別:
- 国際会議録
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11
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Template fabrication for sub-80-nm contact hole patterning using step and flash imprint lithography
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