Characterization of DUV and VUV optical components

Characterization of DUV and VUV optical components

著者名:

Mann, K.R. ( Laser-Lab. Goettingen e.V. (Germany) )
Eckert, G.
Goerling, C.
Leinhos, U.
Schaefer, B.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1742

終了ページ:

1752

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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1 国際会議録 Optical metrology in the VUV and EUV spectral range Mann, K.R., Kranzusch, S., Eckert, G., Goerling, C., Leinhos, U., Peth, C., Schaefer, B. SPIE-The International Society for Optical Engineering	7 国際会議録 Development of diagnostic tools for the EUV spectral range Mann, K.R., Kranzusch, S., Eckert, G., Peth, C., Schaefer, B. SPIE-The International Society for Optical Engineering
2 国際会議録 Testing of optical components for microlithography at 193- and 157-nm Mann,K.R., Apel,O., Eckert,G., Gorling,C., Leinhos,U., Schafer,B. SPIE-The International Society for Optical Engineering	8 国際会議録 Characterization of absorption losses in deep UV optical materials K. Mann, U. Leinhos, B. Schäfer SPIE - The International Society of Optical Engineering
3 国際会議録 Repetition rate dependence of two-photon absorption and self-trapped exciton luminescence in CaF2 at 193 nm Goerling, C., Leinhos, U., Mann, K.R. SPIE-The International Society for Optical Engineering	9 国際会議録 Characterization of absorption and degradation on optical components for high-power excimer lasers Mann,K.R., Eva,E., Granitza,B. SPIE-The International Society for Optical Engineering
4 国際会議録 Comparative studies of absorptance behavior and laser-induced fluorescene of alkaline-earth fluorides at 193 and 157 nm Goerling, Ch., Leinhos, U., Mann, K.R. SPIE-The International Society for Optical Engineering	10 国際会議録 CHARISMA: a new way for angular-resolved scattering measurements Apel,O., Gorling,C., Leinhos,U., Mann,K.R., Schafer,B. SPIE-The International Society for Optical Engineering
5 国際会議録 Long-term test and characterization of optical components at 193 nm and 157 nm Vogler,K., Klaft,I., Schroder,T., Stamm,U., Mann,K.R., Apel,O., Gorling,C., Leinhos,U. SPIE-The International Society for Optical Engineering	11 国際会議録 Characterization of absorption and scatter losses on optical components for ArF excimer lasers Mann,K.R., Apel,O., Eva,E. SPIE - The International Society for Optical Engineering
6 国際会議録 Interfacial absorption of DUV coatings Apel,O., Schulz-Grosser,M., Leinhos,U., Kennedy,M., Mann,K.R., Schuhmann,R.G. SPIE-The International Society for Optical Engineering	12 国際会議録 Multiple-pulse damage thresholds of optical components for excimer lasers Mann,K.R., Granitza,B., Eva,E. SPIE-The International Society for Optical Engineering

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