High-NA ArF lithography for 70-nm technologies
- 著者名:
- Montgomery, P.K. ( Motorola (USA) )
- Vandenberghe, G. ( IMEC (Belgium) )
- Lucas, K. ( Motorola (USA) )
- 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1613
- 終了ページ:
- 1624
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
類似資料:
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SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |