Double-exposure strategy using OPC and simulation and the performance on wafer with sub-0.10-μm design rule in ArF lithography
- 著者名:
Oh, S.-Y. ( Hynix Semiconductor Inc. (Korea) ) Kim, W.-H. Yune, H.-S. Kim, H.-B. Kim, S.-M. Ahn, C.-N. Shin, K.-S. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1537
- 終了ページ:
- 1543
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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10
国際会議録
Trench pattern lithography for 0.13- and 0.10-μm logic devices at 248- and 193-nm wavelengths
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