Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

Printing 100-nm and sub-100-nm DRAM full-chip patterns with crosspole illumination in 0.63-NA ArF lithography

著者名:

Kim, S.-K. ( Hynix Smiconductor Inc. (Korea) )
Bok, C.-K.
Shin, K.-S.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1504

終了ページ:

1512

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

類似資料:

1 国際会議録 0.33-k1 ArF lithography for 100-nm DRAM Bok, C.K., Kim, S.-K., Kim, H.-B., Oh, J.-S., Ahn, C.-N., Shin, K.-S. SPIE-The International Society for Optical Engineering	7 国際会議録 Application of full-chip level optical proximity correction to memory device with sub-0.10-μm design rule and ArF lithography Yune,H.-S., Kim,H.-B., Kim,W.-H., Ahn,C.-N., Ham,Y.-M., Shin,K.-S. SPIE-The International Society for Optical Engineering
2 国際会議録 Feasibility study of printing sub-100-nm with ArF lithography Kim,S.-K., Hong,J.-G., Park,J.-O., Yoo,T.-J., Hyun,Y.-S., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering	8 国際会議録 Novel high-performance ArF resist for sub-100-nm lithography Lee,G., Koh,C.-W., Jung,J.-C., Jung,M.-H., Kong,K.-K., Kim,J.-S., Shin,K.-S., Choi,S.-J., Kim,Y.-S., Choi,Y.-J., … SPIE-The International Society for Optical Engineering
3 国際会議録 Printing 95-nm DRAM full chip patterns in KrF lithography Kim, S.-K., Kim, J.-S., Yoo, T.-J., Kong, K.-K., Yun, H.-S., Kim, Y.-D., Kim, H.-R., Kim, Y.-S., Kim, H.S. SPIE-The International Society for Optical Engineering	9 国際会議録 Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell Lee, J.-H., Chung, D.-H., Cha, D.-C., Kim, H.-S., Park, J.-S., Nam, D.-G., Woo, S.-K., Cho, H.-S., Han, W.-S. SPIE-The International Society for Optical Engineering
4 国際会議録 Challenge for sub-100-nm DRAM gate printing using ArF lithography with combination of moderate OAI and attPSM Kim,Y.-C., Vandenberghe,G.N., Verhaegen,S., Ronse,K. SPIE-The International Society for Optical Engineering	10 国際会議録 Comparison study for sub-0.13-ｦﾌm lithography between ArF and KrF lithography Kim,S.-K., Kim,Y.-S., Kim,J.-S., Bok,C.-K., Ham,Y.-M., Baik,K.-H. SPIE - The International Society for Optical Engineering
5 国際会議録 CD metrology for avoiding shrinkage of ArF resist patterns in 100-nm ArF lithography You, T.-J., Bok, C.-K., Shin, K.-S. SPIE-The International Society for Optical Engineering	11 国際会議録 Evaluation of ArF CLM in the sub-100-nm DRAM cell Lee, J.-H., Chung, D.-H., Kim, H.-C., Nam, D.-S., Woo, S.-G., Cho, H.-K., Han, W.-S. SPIE-The International Society for Optical Engineering
6 国際会議録 Comparison study on mask error factor in 100-nm ArF and KrF lithography Eom,T.-S., Hyun,Y.-S., Kim,C.-K., Bok,C.-K., Shin,K.-S. SPIE-The International Society for Optical Engineering	12 国際会議録 Sub-100-nm DRAM cell patterning results and relation with lens aberration at 248-nm lithography era You, T.-J., Kim, H.S., Kim, J.-S., Kim, S.-K., Kim, Y.-D., Youn, H.S., Kong, K.-K. SPIE-The International Society for Optical Engineering

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