Influence of OPC features on the profile of 2D mask patterns

Influence of OPC features on the profile of 2D mask patterns

著者名:

Khoh, A. ( Optical Sciences Ctr./Univ. of Arizona )
Milster, T. ( Optical Sciences Ctr./Univ. of Arizona (USA) )
Choi, B.-I. ( Chartered Semiconductor Manufacturing, Ltd. (Singapore) )
Samudra, G.S. ( National Univ. of Singapore )
Wu, Y.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1127

終了ページ:

1138

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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