Monte Carlo method for highly efficient and accurate statistical lithography simulations

Monte Carlo method for highly efficient and accurate statistical lithography simulations

著者名:

Postnikov, S.V. ( Motorola (USA) )
Lucas, K.
Wimmer, K.
Ivin, V. ( SOFT-TEC (Russia) )
Rogov, A.

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part Two

開始ページ:

1118

終了ページ:

1126

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012526
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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2 国際会議録 Method of easily extracting resist development parameters for lithography simulation Lucas,K.D., Ivin,V.V., Kudrja,V.P., Larin,D.Yu., Makhviladze,T.M., Medvedeva,M.G., Rogov,A.A., Verzunov,S.V., Yang,D.C. SPIE-The International Society for Optical Engineering	8 国際会議録 Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets Hector, S.D., Postnikov, S.V., Cobb, J. SPIE - The International Society of Optical Engineering
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