Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node
- 著者名:
Patterson, K. ( Motorola (USA) ) Litt, L.C. Maltabes, J.G. Hughes, G.P. ( DuPont Photomasks, Inc. (USA) ) Robertson, T. ( Motorola (USA) ) Montgomery, B. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 1033
- 終了ページ:
- 1040
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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3
国際会議録
Through pitch intensity balancing and phase error analysis of 193-nm alternating phase shift masks
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Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode
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