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Effect of quartz phase etch on 193-nm alternating phase-shift mask performance for the 100- nm node

著者名:
Patterson, K. ( Motorola (USA) )
Litt, L.C.
Maltabes, J.G.
Hughes, G.P. ( DuPont Photomasks, Inc. (USA) )
Robertson, T. ( Motorola (USA) )
Montgomery, B.
さらに 1 件
掲載資料名:
Optical Microlithography XV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4691
発行年:
2002
巻:
Part Two
開始ページ:
1033
終了ページ:
1040
総ページ数:
8
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
言語:
英語
請求記号:
P63600/4691
資料種別:
国際会議録

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