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Aberration sensitivity control for the isolation layer in low-k1 DRAM process

著者名:
Cho, B.-H. ( Hynix Semiconductor Inc. (Korea) )
Yim, D.
Park, C.-H.
Lee, S.-H.
Yang, H.-J.
Choi, J.-H.
Shin, Y.-C.
Kim, C.-D.
Choi, J.-S.
Kang, K.-O.
Kim, S.-W.
Yu, T.-H.
Hong, J.
Kim, J.-C.
Han, M.-S.
Heo, H.-Y.
Kim, Y.-D.
Lee, D.-D.
Yoon, G.-H.
van schoot, J.B. ( ASML (Netherlands) )
Theeuwes, T. ( ASML (Korea) )
Min, Y.-H.
さらに 17 件
掲載資料名:
Optical Microlithography XV
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4691
発行年:
2002
巻:
Part Two
開始ページ:
831
終了ページ:
839
総ページ数:
9
出版情報:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819444370 [0819444375]
言語:
英語
請求記号:
P63600/4691
資料種別:
国際会議録

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