157-nm lithography with high numerical aperture lens for 70-nm technology node
- 著者名:
Suganaga, T. ( Semiconductor Leading Edge Technologies, Inc. (Japan) ) Kanda, N. Kim, J.-H. Yamabe, O. Watanabe, K. Furukawa, T. Miyoshi, S. Itani, T. Cashmore, J.S. ( Exitech Ltd. (UK) ) Gower, M.C. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 584
- 終了ページ:
- 593
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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5
国際会議録
Impact of attenuated phase-shifting mask for 157-nm lithography with high numerical aperture lens
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
6
国際会議録
Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |