Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
- 著者名:
Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) Corcoran, N.P. Eurlings, M. ( ASML (Netherlands) ) Knose, W.T. ( ASML MaskTools, Inc. (USA) ) Laidig, T.L. Wampler, K.E. Roy, S. Shi, X. Hsu, C.M. Chen, J.F. Finders, J. ( ASML (Netherlands) ) Socha, R.J. ( ASML (USA) ) Dusa, M.V. - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 476
- 終了ページ:
- 490
- 総ページ数:
- 15
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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