Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
- 著者名:
Socha, R.J. ( ASML (USA) ) Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) ) Yu, L. Conley, W. ( Motorola (USA) ) Wu, W. Chen, J.F. ( ASML MaskTools, Inc. (USA) ) Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) ) Gerold, D.J. van Praagh, J. ( ASML (Netherlands) ) Droste, R. Flagello, D.G. ( ASML (USA) ) Hsu, S.D. ( ASML MaskTools, Inc. (USA) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 446
- 終了ページ:
- 458
- 総ページ数:
- 13
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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10
国際会議録
Near-0.3 k1 full pitch range contact hole patterning using chromeless phase lithography (CPL)
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