Model-based design improvements for the 100-nm lithography generation
- 著者名:
Lucas, K. ( Motorola (USA) ) Postnikov, S.V. Patterson, K. Yuan, C.-M. Thomas, C. Thompson, M.A. Carter, R. Litt, L.C. Montgomery, P.K. ( Motorola (USA) ) Wimmer, K. ( Motorola (USA) ) - 掲載資料名:
- Optical Microlithography XV
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4691
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 215
- 終了ページ:
- 226
- 総ページ数:
- 12
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444370 [0819444375]
- 言語:
- 英語
- 請求記号:
- P63600/4691
- 資料種別:
- 国際会議録
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