Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL)

著者名:

Van Den Broeke, D.J. ( ASML MaskTools, Inc. (USA) )

Socha, R.J. ( ASML (USA) )

Petersen, J.S. ( Petersen Advanced Lithography, Inc. (USA) )

さらに 2 件

掲載資料名:

Optical Microlithography XV

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4691

発行年:

2002

巻:

Part One

開始ページ:

196

終了ページ:

214

総ページ数:

19

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444370 [0819444375]

言語:

英語

請求記号:

P63600/4691

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012525
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	2002 : 15th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.05-2002.03.08

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