Thin organic bottom antireflective coatings for 193-nm lithography

Thin organic bottom antireflective coatings for 193-nm lithography

著者名:

Bhave, M. ( Brewer Sience, Inc. (USA) )

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part Two

開始ページ:

1074

終了ページ:

1084

総ページ数:

11

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012524
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

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1 国際会議録 Second-generation 193-nm bottom antireflective coatings(BARCs) Meador,J.D., Shao,X., Krishnamurthy,V., Arjona,M., Bhave,M., Xu,G., Claypool,J.B., Lindgren,A. SPIE - The International Society for Optical Engineering	7 国際会議録 Recent progress in 193-nm antireflective coatings Meador, J. D., Guerrero, D. J., Xu, G., Shao, X., Dobson, N., Claypool, J., Nowak, K. SPIE - The International Society of Optical Engineering
2 国際会議録 Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs) Meador,J.D., Shao,X., Bhave,M., Cox,C., Thompson,J., Thomas,D.L., Gibbons,S., Farnsworth,A., Rich,M.D. SPIE-The International Society for Optical Engineering	8 国際会議録 Organosiloxane based bottom antireflective coatings for 193nm lithography Son, E.-K., Kim, J.-W., Lee, S.-H., Park, C.-S., Lee, J.-W., Kim, J., Lee, G.-S., Lee, S.-K., Ban, K.-D., Jung, J.-C., … SPIE - The International Society of Optical Engineering
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4 国際会議録 Design considerations for bottom antireflective coating for 157-nm lithography Claypool, J.B., Puligadda, R., Akers, J., Sakamoto, R., Mizusawa, K.-I. SPIE-The International Society for Optical Engineering	10 国際会議録 Organic antireflective coatings for 193-nm lithography Trefonas, P., Blacksmith, R. F., Szmanda, C. R., Kavanagh, R. J., Adams, T. G., Taylor, G. N., Coley, S., Pohlers, G. SPIE - The International Society of Optical Engineering
5 国際会議録 New fast-etching bottom antireflective coatings for 248-nm lithography Puligadda,R., Huang,R., Cox,C., Lamb Ⅲ,J.E., Arjona,M., Claypool,J.B. SPIE-The International Society for Optical Engineering	11 国際会議録 Highly etch-selective spin-on bottom antireflective coating for use in 193-nm lithography and beyond Pfeiffer, D., Mahorowala, A.P., Babich, K., Medeiros, D.R., Petrillo, K.E., Angelopoulos, M., Huang, W.-S., Halle, S., … SPIE-The International Society for Optical Engineering
6 国際会議録 Developable bottom antireflective coatings for 248-nm and 193-nm lithography Katayama, T., Motobayashi, H., Kang, W.-B., Toukhy, M.A., Oberlander, J.E., Ding, S.S., Neisser, M. SPIE - The International Society of Optical Engineering	12 国際会議録 Bottom antireflective coatings (BARCs) for 157-nm lithography He, L., Puligadda, R., Lowes, J., Rich, M.D. SPIE - The International Society of Optical Engineering

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