Resist develop prediction by Monte Carlo simulation
- 著者名:
- Sohn, D.-S. ( Hanyang Univ. (Korea) )
- Jeon, K.-A.
- Sohn, Y.-S.
- Oh, H.-K.
- 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 971
- 終了ページ:
- 977
- 総ページ数:
- 7
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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8
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Modification of development parameters of 193-nm chemically amplified resist with pattern density
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