Implementation of the ArF resists based on VEMA for sub-100-nm device
- 著者名:
Kim, H.-W. ( Samsung Electronics Co., Ltd. (Korea) ) Lee, S. Choi, S.-J. Lee, S.-H. Kang, Y. Woo, S.-G. Nam, D.S. Chae, Y.-S. Kim, J.S. Moon, J.-T. Kavanagh, R.J. ( Shipley Co. LLC (USA) ) Barclay, G.G. - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 533
- 終了ページ:
- 540
- 総ページ数:
- 8
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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