Ultrathin film imaging at 157nm
- 著者名:
Rottstegge, J. ( Infineon Technologies AG (Germany) ) Herbst, W. Hien, S. ( Infineon Technologies AG (Germany) ) Fuetterer, G. ( Friedrich-Alexander Univ. Erlangen-Nuernberg (Germany) ) Eschbaumer, C. ( Infineon Technologies AG (Germany) ) Hohle, C. Schwider, J. ( Friedrich-Alexander Univ. Erlangen-Nuernberg (Germany) ) Sebald, M. ( Infineon Technologies AG (Germany) ) - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 233
- 終了ページ:
- 241
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |