Pattern transfer processes for 157-nm lithography

Pattern transfer processes for 157-nm lithography

著者名:

Miyoshi, S. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )
Furukawa, T.
Watanabe, H.
Irie, S.
Itani, T.

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

221

終了ページ:

232

総ページ数:

12

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

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1 国際会議録 157-nm lithography for 65-nm node SRAM-gate Suganaga, T., Irie, S., Miyoshi, S., Kim, J.-H., Watanabe, K., Kurose, E., Furukawa, T., Hagiwara, T., Ishimaru, T., … SPIE-The International Society for Optical Engineering	7 国際会議録 Feasibility study of defects in 157-nm resist process Wakamizu, S., Kiba, Y., Kawaguchi, E., Miyoshi, S., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
2 国際会議録 Environmental control for lithography with 157-nm exposure Kitano, J., Kiba, Y., Inazawa, K., Miyoshi, S., Watanabe, H., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering	8 国際会議録 157-nm lithography with high numerical aperture lens for 70-nm technology node Suganaga, T., Kanda, N., Kim, J.-H., Yamabe, O., Watanabe, K., Furukawa, T., Miyoshi, S., Itani, T., Cashmore, J.S., … SPIE-The International Society for Optical Engineering
3 国際会議録 157-nm bilayer resist: patterning and etching performance Miyoshi, S., Furukawa, T., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering	9 国際会議録 Resist materials for 157-nm lithography Toriumi,M., Ishikawa,S., Miyoshi,S., Naito,T., Yamazaki,T., Watanabe,M., Itani,T. SPIE-The International Society for Optical Engineering
4 国際会議録 Sub-70-nm pattern fabrication using an alternating phase-shifting mask in 157-nm lithography Irie, S., Kanda, N., Watanabe, K., Suganaga, T., Itani, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Development of organic bottom antireflective coating for 157-nm lithography Irie, S., Shigematsu, M., Miyoshi, S., Sakamoto, R., Mizusawa, K., Nakajima, Y., Itani, T. SPIE-The International Society for Optical Engineering
5 国際会議録 Critical dimension (CD) control in 157-nm lithography Hori, S., Yoshihara, K., Kyoda, H., Matsui, H., Furukawa, T., Miyoshi, S., Kawaguchi, E., Itani, T. SPIE-The International Society for Optical Engineering	11 国際会議録 Application of top surface imaging process to 157-nm lithography Satou,I., Watanabe,M., Watanabe,H., Itani,T. SPIE-The International Society for Optical Engineering
6 国際会議録 Advances in resist pattern transfer process using 157-nm lithography Furukawa, T., Hagiwara, T., Kawaguchi, E., Matsunaga, K., Suganaga, T., Itani, T., Fujii, K. SPIE - The International Society of Optical Engineering	12 国際会議録 Defect analysis in 157-nm photolithography process Hori, S., Miyahara, O., Kiba, Y., Ono, Y., Kitano, J., Miyoshi, S., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering

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