High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate
- 著者名:
Rahman, M.D. ( Clariant Corp. (USA) ) Alemy, E. Conley, W. ( International SEMATECH (USA) ) Miller, D. Dammel, R.R. ( Clariant Corp. (USA) ) Kim, W.-K. Kudo, T. Lee, S.-H. Masuda, S. McKenzie, D.S. Padmanaban, M. - 掲載資料名:
- Advances in Resist Technology and Processing XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4690
- 発行年:
- 2002
- 巻:
- Part One
- 開始ページ:
- 127
- 終了ページ:
- 135
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444363 [0819444367]
- 言語:
- 英語
- 請求記号:
- P63600/4690
- 資料種別:
- 国際会議録
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SPIE-The International Society for Optical Engineering |
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SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |