Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

Synthesis of novel fluoropolymers for 157-nm photoresists by cyclopolymerization

著者名:

Kodama, S. ( Asahi Glass Co., Ltd. (Japan) )

Shida, N. ( Semiconductor Leading Edge Technologies, Inc. (Japan) )

掲載資料名:

Advances in Resist Technology and Processing XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

4690

発行年:

2002

巻:

Part One

開始ページ:

76

終了ページ:

83

総ページ数:

8

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819444363 [0819444367]

言語:

英語

請求記号:

P63600/4690

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00012523
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2002 : 19th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2002.03.04-2002.03.06

類似資料:

1 国際会議録 Dry-etching resistance of fluoropolymers for 157-nm single-layer resists Kawaguchi, Y., Irisawa, J., Kodama, S., Okada, S., Takebe, Y., Kaneko, I., Yokokoji, O., Ishikawa, S., Irie, S., … SPIE-The International Society for Optical Engineering	7 国際会議録 157-nm single-layer resist based on novel monocyclic fluorinated polymer Otoguro, A., Irie, S., Itani, T., Fujii, K., Takebe, Y., Kawaguchi, Y., Yokokoji, O. SPIE - The International Society of Optical Engineering
2 国際会議録 Fluoropolymer resists for 157-nm lithography Toriumi, M., Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Itani, T. SPIE-The International Society for Optical Engineering	8 国際会議録 A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists Houlihan, F., Sakamuri, R., Hamilton, K., Dimerli, A., Rentkiewicz, D., Romano, A., Dammel, R. R., Wei, Y., Stepanenko, … SPIE - The International Society of Optical Engineering
3 国際会議録 Performances of resists for 157-nm lithography based on monocyclic fluoropolymers Ishikawa, S., Irie, S., Itani, T., Kawaguchi, Y., Yokokoji, O., Kodama, S.-. SPIE-The International Society for Optical Engineering	9 国際会議録 Synthesis of novel fluorinated norbornene derivatives for 157-nm application Koh, M., Ishikawa, T., Toriumi, M., Araki, T., Yamashita, T., Aoyama, H., Yamazaki, T., Furukawa, T., Itani, T. SPIE-The International Society for Optical Engineering
4 国際会議録 157-nm single-layer resists based on advanced fluorinated polymers Shida, N., Watanabe, H., Yamazaki, T., Ishikawa, S., Toriumi, M., Itani, T. SPIE-The International Society for Optical Engineering	10 国際会議録 Resist materials for 157-nm lithography Toriumi,M., Ishikawa,S., Miyoshi,S., Naito,T., Yamazaki,T., Watanabe,M., Itani,T. SPIE-The International Society for Optical Engineering
5 国際会議録 A new monocyclic fluropolymer structure for 157-nm photoresists Takebe, Y., Eda, M., Okada, S., Yokokoji, O., Irie, S., Otoguro, A., Fujii, K., Itani, T. SPIE - The International Society of Optical Engineering	11 国際会議録 Characterization of TFE/norbornene-based fluoropolymer resist for 157-nm lithography Hagiwara, T., Furukawa, T., Itani, T., Fujii, K., Ishikawa, T., Koh, M., Kodani, T., Moriya, T., Yamashita, T., Araki, … SPIE - The International Society of Optical Engineering
6 国際会議録 Novel main-chain-fluorinated polymers for 157-nm photoresists Toriumi, M., Koh, M., Ishikawa, T., Kodani, T., Araki, T., Aoyama, H., Yamashita, T., Yamazaki, T., Furukawa, T., Itani, … SPIE-The International Society for Optical Engineering	12 国際会議録 The dissolution behavior of tetrafluoroethylene-based fluoropolymers for 157-nm resist materials Ishikawa, T., Kodani, T., Koh, M., Moriya, T., Araki, T., Aoyama, H., Yamashita, T., Toriumi, M., Hagiwara, T., … SPIE - The International Society of Optical Engineering

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