Effect of various ArF resist shrinkage amplitudes on CD bias
- 著者名:
Ke, C.-M. ( Taiwan Semiconductor Manufacturing Co., Ltd. ) Gau, T.-S. Chen, P.-H. Yen, A. Lin, B.J. Otaka, T. ( Hitachi High-Technologies Corp. (Japan) ) Iizumi, T. Sasada, K. Ueda, K. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography XVI
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4689
- 発行年:
- 2002
- 巻:
- Part Two
- 開始ページ:
- 997
- 終了ページ:
- 1006
- 総ページ数:
- 10
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819444356 [0819444359]
- 言語:
- 英語
- 請求記号:
- P63600/4689
- 資料種別:
- 国際会議録
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